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介质阻挡放电中氢分子的光谱特性

Investigation on spectral characteristics of H_2 in dielectric barrier discharge
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摘要 为揭示介质阻挡放电氢等离子体中氢负离子的形成过程和规律,采用发射光谱技术研究了氢分子振动、转动温度以及对H-离子的影响。基于Fulcher跃迁的理论模型,计算了不同振转温度时的谱线强度分布,验证了实验测定结果。在气压70 Pa、电压12 kV、频率30 kHz,运用(0-0)带与(1-1)带谱线强度比计算出振动温度为2 700 K,利用(0-0)带的五条谱线求得转动温度为400 K。当放电频率由10 kHz增加到22 kHz时,振动温度由1 560 K增大到3 900 K,相应的氢离子质谱信号强度也逐渐增大。振动温度的增加是导致氢负离子浓度增大的重要原因。该研究可以用于介质阻挡放电氢等离子体中的振转分布提供一定的参考。 This paper is aimed at identifying the formation process and rule underlying H-ion in dielectric barrier discharge hydrogen plasma. The targeted research consists of investigating the vibration and rotational temperature of hydrogen molecules and their effects on H-ions using optical emission spectrometry; calculating the intensity distribution of spectral lines at different rotational temperatures; and comparing the calculation with the experimental results; in the presence of the discharge conditions( gas pressure 70 Pa,30 kHz,12 k V),the vibration temperature calculating to be 2 700 K using the intensity ratio of( 0-0) band and( 1-1) band spectrum line; calculating the rotation temperature to be 400 K using five bands of( 0-0) band. The results demonstrate that the discharge frequency increase from10 kHz to 22 kHz suggests the vibration temperature increase from 1 560 K to 3 900 K,together with a gradual increase in the corresponding signal intensity of hydrogen ion mass spectrometry; and the increase of temperature is an important reason for the increase of hydrogen anion concentration. This study may provide a certain reference for the vibrational distribution of H-ion in dielectric barrier discharge.
作者 王卫国 张增凤 Wang Weiguo;Zhang Zengfeng(Chinese Academy of Sciences,Dalian Institute of Chemical Physics,Dalian 116023,China;School of Sciences,Heilongjiang University of Science & Technology,Harbin 150022,China)
出处 《黑龙江科技大学学报》 CAS 2018年第3期308-312,共5页 Journal of Heilongjiang University of Science And Technology
基金 国家自然科学基金项目(10474009 10475015)
关键词 发射光谱 振转分布 介质阻挡放电 等离子体诊断 emission spectrometry vibrational distribution dielectric barrier discharge plasma diagnosis
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  • 1刘卫平,余庆选,田宇全,廖源,王冠中,方容川.硼掺杂对金刚石薄膜生长特性的影响[J].无机材料学报,2005,20(5):1270-1274. 被引量:2
  • 2毛卫民,朱宏喜,陈冷,冯惠平,吕反修.CVD自支撑金刚石薄膜中的宏观织构与微观孪晶[J].无机材料学报,2006,21(1):239-244. 被引量:10
  • 3李多生,左敦稳,陈荣发,相炳坤,赵礼刚,王珉.直流等离子体CVD金刚石薄膜微观结构分析[J].稀有金属材料与工程,2007,36(4):648-651. 被引量:8
  • 4Malshe A P, Park B S, Brown W D, et al. Diamond and Related Materials, 1999, 8(7) . 1198.
  • 5Bert Willems, Alexandre Tallaire, Jocelyn Achard. Diamond and Related Materials, 2014, 41: 25.
  • 6Muchnikov A B, Vikharev A L, Gorbaehev A M, et al. Diamond and Related Materials, 2010, 19:432.
  • 7Ding Ming Q, Li Lili, Feng Jinjun. Applied Surface Science, 2012, 258.- 5987.
  • 8DINGMing-qing,CHENChang-qing,BAIGuo-dong,etal(丁明清,陈长青,白国栋,等).真空科学与技术学报,2011,31(6):661.
  • 9Han Young-Soo, Kim Yoon-Kee, Lee Jai-Young. Thin :Solid Film, 1997, 310: 39.
  • 10Chen Chia-Fu, Huang Yen C, Satoru Hosomi, et al. Materials Research Bulletin, 1989, 24(1):87.

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