摘要
利用磁控溅射的方法,在相同的陶瓷衬底上面分别镀上3种不同金属,形成3种不同的金属衬底,对金属层进行相同的表面处理后,放入微波等离子体化学气相沉积腔中,制备出3种碳膜。对制备出不同的碳膜用扫描电镜、拉曼光谱、X射线衍射仪进行结构分析,并用二极管型结构测试了它们的场致发射电子的性能。找到了最适合场发射的金属衬底,进一步对不同金属衬底制备碳膜的场发射特性不同的原因进行了初步的研究。
By changing the processing method on the surface of the substrate,different micron diamond film is prepared. Specific method is to use the magnetron sputtering plating on ceramic substrate on a thick layer of titanium,the titanium layer with different surface treatment,after put in microwave plasma chemical vapor deposition in the cavity preparation micron diamond film. Of different type film using diode structure to test the performance of their field emission electron,can achieve a good surface treatment under the electric field of 2. 1 V/μm,9. 2 mA/cm2 excellent effect. And emission mechanism and the field emission properties were studied.
作者
高金海
张武勤
李桢
张兵临
GAO Jinhai;ZHANG Wuqin;LI Zhen;ZHANG Binlin(Department of Physics, Zhengzhou normal university, Zhengzhou 450044, China;Physics engineering college, Zhengzhou University, Zhengzhou 450052, China)
出处
《电子器件》
CAS
北大核心
2018年第3期572-575,共4页
Chinese Journal of Electron Devices
基金
教育部科学技术重点资助项目(205091)
河南省科学技术成果项目(教高豫科鉴委字[2015]第569号)
河南省高等学校重点科研项目(16A140039)
河南省科技攻关项目(2018)
关键词
碳膜
微米金刚石薄膜
场致发射电子
微波等离子体化学气相沉积
Micron diamond
thin film preparation
field emission electron
microwave plasma chemical vapor deposition
