期刊文献+

A GaN/InGaN/AlGaN MQW RTD for versatile MVL applications with improved logic stability 被引量:1

A GaN/InGaN/AlGaN MQW RTD for versatile MVL applications with improved logic stability
原文传递
导出
摘要 To improve the logic stability of conventional multi-valued logic(MVL) circuits designed with a GaNbased resonate tunneling diode(RTD), we proposed a GaN/InGaN/AlGaN multi-quantum well(MQW) RTD. The proposed RTD was simulated through solving the coupled Schrodinger and Poisson equations in the numerical non-equilibrium Green's function(NEGF) method on the TCAD platform. The proposed RTD was grown layer by layer in epitaxial technologies. Simulated results indicate that its current-voltage characteristic appears to have a wider total negative differential resistance region than those of conventional ones and an obvious hysteresis loop at room temperature. To increase the Al composite of AIGaN barrier layers properly results in increasing of both the total negative differential resistance region width and the hysteresis loop width, which is helpful to improve the logic stability of MVL circuits. Moreover, the complement resonate tunneling transistor pair consisted of the proposed RTDs or the proposed RTD and enhanced mode HEMT controlled RTD8 is capable of generating versatile MVL modes at different supply voltages less than 3.3 V, which is very attractive for implementing more complex MVL function digital integrated circuits and systems with less devices, super high speed linear or nonlinear ADC and voltage sensors with a built-in super high speed ADC function. To improve the logic stability of conventional multi-valued logic(MVL) circuits designed with a GaNbased resonate tunneling diode(RTD), we proposed a GaN/InGaN/AlGaN multi-quantum well(MQW) RTD. The proposed RTD was simulated through solving the coupled Schrodinger and Poisson equations in the numerical non-equilibrium Green's function(NEGF) method on the TCAD platform. The proposed RTD was grown layer by layer in epitaxial technologies. Simulated results indicate that its current-voltage characteristic appears to have a wider total negative differential resistance region than those of conventional ones and an obvious hysteresis loop at room temperature. To increase the Al composite of AIGaN barrier layers properly results in increasing of both the total negative differential resistance region width and the hysteresis loop width, which is helpful to improve the logic stability of MVL circuits. Moreover, the complement resonate tunneling transistor pair consisted of the proposed RTDs or the proposed RTD and enhanced mode HEMT controlled RTD8 is capable of generating versatile MVL modes at different supply voltages less than 3.3 V, which is very attractive for implementing more complex MVL function digital integrated circuits and systems with less devices, super high speed linear or nonlinear ADC and voltage sensors with a built-in super high speed ADC function.
出处 《Journal of Semiconductors》 EI CAS CSCD 2018年第7期77-87,共11页 半导体学报(英文版)
基金 Project supported by the National Natural Science Foundation of China(Nos.61302009,61571171)
关键词 GaN/InGaN/AlGaN MQW RTD total NDR region width hysteresis characteristic MVL GaN/InGaN/AlGaN MQW RTD total NDR region width hysteresis characteristic MVL
  • 相关文献

参考文献1

二级参考文献16

  • 1Seabaugh A C, Kao Y C, Yuan H T, et al. Nine-state resonant tunneling diode memory. IEEE Electron Device Lett, 1992, 13(9): 479.
  • 2Pacha C, Auer U, Burwick C, et al. Threshold logic circuit design of parallel adders using resonant tunneling devices. IEEE Trans VLSJ Syst, 2000, 8(5): 558.
  • 3Matsuzaki H, Osaka J, Itoh T, et al. Monolithic integration of resonant tunneling diodes, Schottky barrier diodes and O.l-J.Lmgate high electron mobility transistors for high speed JCs. Jpn J Appl Phys, 2001, 40( 4A): 2186.
  • 4Shimizu N, Nagatsuma T, Waho T, et al. InGaAs/AlAs resonant tunneling diodes with switching time of 1.5 ps. Electron Lett, 1995,31(19): 1694.
  • 5Brown E R, Soderstrom J R, Parker C D, et al. Oscillations up to 712 GHz in InAsl AISb resonant tunneling diodes. Appl Phys Lett, 1991,58(20): 2291.
  • 6Wei S J, Lin H C. Multivalued SRAM cell using resonant tunneling diodes. IEEE J Solid-state Circuits, 1992,27(2): 212.
  • 7Waho T, Chen K J, Yamamot M 0, et al. A novel functionallogic circuit using resonant-tunneling devices for multiplevalued logic applications. Jpn J Appl Phys, 1997, 36(3 suppl. B): 1818.
  • 8Maezawa K, Akeyoshi T, Mizutani T, et al. Flexible and reducedcomplexity logic circuits implemented with resonant tunneling transistors. IEDM, 1993: 415.
  • 9Shen J, Tehrani S, Goronkin H, et al. An exclusive NOR based on resonant interband tunneling FET's. IEEE Electron Device Lett, 1996, 17(3): 94.
  • 10Yen J C, Zhang Q, Mondry M J, et al. Monolithic integrated resonant tunneling diode and heterostructure junction field effect transistor circuits. Solid-State Electron, 1996, 39( 10): 1449.

共引文献1

同被引文献10

引证文献1

二级引证文献3

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部