磁控溅射和能量过滤磁控溅射TiO_2薄膜结构和光学性质的对比研究

Comparative study on structure and optical properties of TiO_2 films by DC magnetron sputtering and energy filtering magnetron sputtering

磁控溅射是一种广泛应用的薄膜制备技术。能量过滤磁控溅射是对磁控溅射技术加以改进后的一种薄膜制备技术。通过改变能量过滤磁控溅射技术过滤电极网孔大小制备TiO_2薄膜,研究了网孔目数对薄膜物相结构、表面形貌以及光学性质的影响,并与磁控溅射技术制备的TiO_2薄膜进行了对比研究。结果表明:(1)能量过滤磁控溅射技术较磁控溅射技术所制备薄膜的结构均匀性更加优异,薄膜的透射率由86.5%增大到91.4%、波长500nm处折射率由1.61增加到1.68、波长300nm处消光系数由0.42降低到0.12;(2)能量过滤磁控溅射技术过滤电极网孔目数不同时薄膜的结晶性能、表面粗糙度以及光学性质均存在差异,且随网孔目数的增加呈周期性变化;(3)过滤电极网孔目数为8目时,薄膜的结晶性能较好、薄膜较为均匀、透射率较高,为91.4%。

Energy filtering magnetron sputtering is a kind of thin film preparation technique that has been improved on the basis of magnetron sputtering technology by our group.In this work,a series of TiO2 thin films were prepared by changing the mesh size of the filtering electrode with the energy filtering magnetron sputtering technique.The effect of mesh size on the phase structure,surface morphology and optical properties of the films was studied,and compared with the TiO2 thin films which were prepared by magnetron sputtering.The results show that the energy filtering magnetron sputtering technique is superior to the magnetron sputtering technique.The structure of the films was more uniform,the transmittance of the film increased from 86.5% to91.4%,the refractive index increased from 1.61 to 1.68 at the wavelength of 500 nm,and the extinction coefficient decreased from 0.42 to 0.12 at the wavelength of 300 nm.There is a periodic change in the crystallization properties,surface roughness and optical properties of the films prepared by the energy filtering magnetron sputtering technique at different filtering electrode mesh size.The crystallization properties,the uniformity and the transmittance of the films prepared by the energy filtering magnetron sputtering technique are the best when the filtering electrode mesh number is 8.