基于微结构的银纳米线透明导电薄膜的光电性能

Photoelectric Performance of Microstructured Silver Nanowires Transparent Conductive Films

首先,采用光刻技术并结合湿法刻蚀工艺,在玻璃衬底上制备出蜂窝状分布的圆台阵列微结构,从占空比和反射、透射光线分布的角度分析其光学性能。然后,采用水热法制备银纳米线,并对样品进行X射线衍射（XRD）物相分析和扫描电子显微镜（SEM）微观形貌表征,得到平均直径为80 nm、长度为110μm、长径比大于1 000的超细长银纳米线。最后,通过浓硫酸和双氧水的混合溶液对微结构表面改性,并采用变速旋涂法将银纳米线与微结构完美嵌合,从而制备出基于玻璃衬底上圆台阵列微结构的银纳米线透明导电薄膜,其光电性能优良,测得其可见光透过率为85.97%、方块电阻平均值为23.1Ω/□。

Firstly,a honeycomb circular array microstructure was fabricated on the glass substrate by the combination of the photolithography with wet etching process.The optical properties of the microstructure were analyzed from the aspects of the duty ratio and the distributions of the reflection and transmission lights.Then,the silver nanowires were prepared by the hydrothermal method,and the X-ray diffraction（XRD）phase analysis and scanning electron microscope（SEM）micro morphology characterization were carried out for the samples.The ultra long and thin silver nanowires were obtained with the mean diameter of 80 nm,the length of 110μm and the length-diameter ratio over 1 000.Finally,the microstructure surface was modified by the mixed solution of the concentrated sulfuric acid and hydrogen peroxide,and the silver nanowires and the microstructure were perfectly tabled by variable speed spin coating.Thus,a silver nanowire transparent conductive film based on the microstructure of the circular array on the glass substrate was prepared.Its photoelectric performance is excellent.And the test results show that the visible light transmittance is 85.97% and the average square resistance is 23.1Ω/□.