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Pb_(0.92)La_(0.08)(Zr_(0.65)Ti_(0.35))O_3铁电薄膜光生伏特效应的研究 被引量:1

Photovoltaic Effect of Pb_(0.92)La_(0.08)(Zr_(0.65)Ti_(0.35))O_3 Ferroelectric Thin Film
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摘要 以醋酸铅、钛酸丁酯、正丁醇锆以及硝酸镧为原料,甲醇和乙醇为溶剂配制Pb_(0.92)La_(0.08)(Zr_(0.65)Ti_(0.35))O_3溶胶,采用溶胶-凝胶法经550℃的快速热处理,在LaNiO_3/Si上制备了Pb_(0.92)La_(0.08)(Zr_(0.65)Ti_(0.35))O_3铁电薄膜。利用X射线衍射仪分析了薄膜组分与结构,标准铁电分析仪测试了薄膜的铁电性能;利用紫外光源对薄膜进行光照实验;通过分析薄膜厚度对其光生伏特效应的影响,进一步探讨分析了铁电薄膜光生伏特效应的产生机理。结果表明,在20 V电压下,薄膜的剩余极化值和矫顽场强分别为17.485μC/cm2和10.78 k V/cm。当紫外光照强度为2.67 m W/cm^2,薄膜厚度为490 nm左右时,薄膜光照后所产生的最大光生电压值为61.5 m V。 Pb(0.92)La(0.08)(Zr(0.65)Ti(0.35))O3 colloidal sol was prepared with lead acetate,butyl titanate,zirconium n-butanol and lanthanum nitrate as raw materials and methanol and ethanol as solvent.Using the sol-gel method with rapid heat treatment of 550 ℃ were prepared on the LaNiO3/Si Pb(0.92)La(0.08)(Zr(0.65)Ti(0.35))O3 ferroelectric thin film.The composition and structure of thin films were analyzed by X-ray diffractometer.The ferroelectric properties of thin films were tested by standard ferroelectric analyzer.UV light source was used to light the film.By analyzing the effect of thin film thickness on the photovolt effect,the mechanism of the photovolt effect of ferroelectric thin films was discussed.The results show that the residual polarization value and coercive field intensity of the film are 17.485 μC/cm^2 and 10.78 kV/cm respectively at a voltage of 20 V.When the ultraviolet light intensity is 2.67 mw/cm^2 and the film thickness is about 490 nm,the maximum photogenic voltage generated by the film after illumination is 61.5 mv.
作者 赵楠 陈国力 王哲 ZHAO Nan;CHEN Guoli;WANG Zhe(Center of Analysis and Testing of School of Chemistry and Chemical Engineering,Qiqihar University,Qiqihar 161006,China)
出处 《铸造技术》 CAS 2018年第7期1595-1599,共5页 Foundry Technology
基金 黑龙江省省属高等学校基本科研业务费科研资助项目(13509227)
关键词 Pb(0.92)La(0.08)(Zr(0.65)Ti(0.35))O3 光生伏特效应 机理 Pb0.92La0.08(Zr0.65Ti0.35)O3 photovoltaic effect mechanism
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