反应气体流量比对PECVD类金刚石薄膜机械性能的影响

Effect of reaction gas flow ratios on mechanical properties of PECVD diamond-like carbon films

实验研究了不同乙炔与氩气流量比R对脉冲等离子体增强化学气相沉积(PECVD)类金刚石薄膜的沉积速率、AFM形貌、膜基结合强度、纳米压痕硬度以及弹性模量的影响。结果表明:薄膜沉积速率随C_2H_2流量的增大而增大,在R为4:1时沉积速率达到最大0.8μm/h;不同气体流量比下薄膜的表面形貌均光滑致密,纳米硬度是316L不锈钢基体的3倍以上;R为3:1时,Raman光谱ID/IG值为最小,对应此流量比下的最高纳米硬度16.1GPa,且粗糙度最低,摩擦系数为0.206。

The effects of pulsed plasma enhanced chemical vapor deposition（PECVD）on the deposition rate,AFM morphology,bonding strength,nanoindentation hardness and elastic modulus of diamond-like carbon（DLC）films were studied under different C2H2 and Ar flow ratios（R=[C2H2]/[Ar]）. The results showed that the deposition rate increases with the increase of C2H2 gas flow rate. The deposition rate reaches a maximum of0.8 μm/h when R is 4：1. The surface morphology of the as-deposited DLC film is smooth and dense at different gas flow ratios and their nano-hardness is about 3 times that of a 316 L stainless steel substrate. As the R is 3：1,ID/IGvalue is the smallest in Raman Spectra,corresponding to which the DLC films have the highest nanohardness of 16.1 GPa and the lowest roughness with the coefficient of friction being 0.206.