推进氧化制程对芯片参数均匀性的影响与改善

Effect of Improving Oxidation Process on Uniformity of Chip parameters and Improvement Oxidation Process

为保证商用芯片生产具有高效率、 高质量和可靠性, 对某型号芯片的工艺制程进行深入探究, 在关键影响因子的改进方面采取针对性措施, 极大改善了该型芯片在每一生产批晶圆中的参数分布均匀性.

In order to ensure the high efficiency, high quality and reliability of the commercial chip production, the technological process of a certain type of chip was deeply explored, and the pertinence measures were taken in the improvement of the key factors, which greatly improved the uniformity of the parameter distribution in each batch of w-afer.