基于多偏振照明的浸没式光刻机投影物镜高阶波像差快速检测技术

High-Order Aberration Measurement Technique for Immersion Lithography Projection Lens Based on Multi-Polarized illuminations

提出了一种基于多偏振照明的浸没式光刻机投影物镜高阶波像差快速检测技术。通过采用一元线性采样方式,在不同偏振照明条件下采集浸没式光刻机投影物镜的空间像进行主成分分析,在快速建模的同时实现高阶波像差的高精度检测。与基于Box-Behnken Design统计抽样方法的超高数值孔径光刻投影物镜高阶波像差检测方法相比,所提技术有效降低了采样数,提高了采样效率,加快了建模速度。采用光刻仿真软件PROLITH对所提技术进行了仿真验证,并分析了照明方式对高阶波像差检测精度的影响。仿真结果表明,该技术对高阶波像差(Z5~Z64)的检测精度优于1.03×10^(-3)λ,同时其建模速度提升了约30倍。

A high-order aberration measurement technique for immersion lithography projection lens based on multipolarized illuminations is proposed.Aerial images of different polarized illuminations are collected by linear sampling,and the measurement model is built quickly based on principle component analysis;the high-order aberration of the immersion lithography projection lens is measured accurately.Compared with the high-order aberration measurement method based on a test target with eight angles,the proposed technique can reduce the number of samples,improve the efficiency of sampling,and speed up modeling.The lithographic simulator PROLITH is used to validate the proposed technique and analyze the influence of the illumination types on the accuracy of the high-order aberration measurement.The results show that the proposed technique can retrieve 60 terms of Zernike coefficients（Z5-Z64）with measurement accuracy better than 1.03×10-3λ,and its modeling speed is improved by about 30 times.