大束流离子注入机颗粒改善

Particle Improvement of High Current Ion Implant

大束流离子注入机是半导体行业中一种十分重要的设备,在生产过程中,影响注入机产品良率和产能的关键因素是颗粒的多少。大束流离子注入机采用靶盘式结构,腔体空间大,腔体内真空度相较于中束流离子注入机低,束流路径大,因此产生颗粒的几率更大。本文先分析了大束流离子注入机颗粒产生的原因,然后提出了气体传导率限制缝和锯齿石墨两种减少颗粒的结构设计,并进行了实验验证,最后给出了颗粒偏高后查找颗粒源的几种方法。

The high current ion implanter is a very important device in the semiconductor industry. During production, one key factor affecting the yield and productivity of the implanter is the number of particles. Typically, the large-beam ion implanter adopts a target disc structure and has a large cavity space. The degree of vacuum in the chamber is lower than that in the middle beam ion implantation machine, and the beam path is large, so the probability of generating particles is much larger. This paper first analyzed the reasons for the generation of particles in the large-beam ion implanter, and then proposed two types of design for reducing particle, i.e., the gas conductivity limiting seam and the sawtooth graphite. Experimental results verified the effectiveness of the proposed methods. At last, this paper proposed several ways of searching particle source when it is high.