TiN/TiCN多层调制结构薄膜的耐蚀性

Corrosion Resistance of TiN/TiCN Multilayer Modulation Structure Films

多弧离子镀和磁控溅射制备薄膜各有优缺点,将2种技术复合制膜的研究还少有报道。采用多弧离子镀和磁控溅射复合技术在304不锈钢基体表面制备了TiN单层和TiN/TiCN多层膜,采用扫描电镜、X射线衍射仪并结合电化学测试等着重研究了不同调制周期下薄膜组织结构与耐腐蚀性能的变化规律。结果表明:所制备的TiN/TiCN多层膜表面平整、致密,随着调制周期的减小,TiN/TiCN多层膜发生生长取向的转变,且具有(111)晶面生长织构; TiN/TiCN多层膜在3.5%NaCl溶液中的抗腐蚀能力优于基体和单层TiN薄膜,随着多层膜调制周期的减小,其抗腐蚀性逐渐增强,在λ=0.150μm时,多层膜的自腐蚀电流密度和极化电阻分别为0.106 7μA/cm^2和679.700 kΩ·cm^2,腐蚀速率下降到最低,具有良好的耐腐蚀性。

TiN monolayer films and TiN/TiCN multilayer films were deposited on 304 stainless steel by combining multi- arc ion plating and magnetron sputtering technique. The structure and corrosion resistance at different modulation periods were mainly investigated by scanning electron microscope, X-ray diffractometer and electrochemical tests. Results showed that as-deposited TiN/TiCN muhilayer films were smooth and dense. With the decrease of modulation period, the TiN/TiCN muhilayer films shifted in growth orientation, presenting （ 111 ） crystal texture. Moreover, the anti-corrosive ability of TiN/TiCN multilayer films in 3.5% NaCl solution was better than those of the substrate and TiN films. As the modulation period decreased, the corrosion resistance of multilayer films intensified gradually. When λ = 0.150μm, the self- corrosion current density and polarization resistance were 0.106 7μA/cm2 and 679.700 k Ω· cm2, which indicated that the corrosion rate declined to the minimum and the prepared coating had excellent corrosion resistance.