摘要
综述了化学抛光机理及化学抛光在金属医疗器械表面改性中的应用。目前对化学抛光的研究主要集中在抛光工艺的优化及抛光液体系的建立。与机械抛光、电化学抛光等其他抛光方法联合应用是克服现有工艺缺陷的主要途径。
The mechanism of chemical polishing and its application to surface modification of metal medical devices were reviewed. At present, the research of chemical polishing is mainly focused on the optimization of polishing process and the establishment of polishing liquid system. Combined with mechanical polishing, electrochemical polishing, and other polishing methods is the main way to overcome the existing defects of chemical polishing processes.
作者
张军伟
周超
侯文博
尹玉霞
王鲁宁
张海军
ZHANG Jun-wei;ZHOU Chao;HOU Wen-bo;YIN Yu-xia;WANG Lu-ning;ZHANG Hai-jun(National United Engineering Laboratory for Biomedical Material Modification Branden Industrial Park,Dezhou 251100,China)
出处
《电镀与涂饰》
CAS
CSCD
北大核心
2018年第11期514-518,共5页
Electroplating & Finishing
基金
国家重点研发计划(2016YFC1102500)
关键词
医用金属
化学抛光
表面改性
medical metal
chemical polishing
surface modification