ZnO薄膜包装材料溅射制备工艺与阻隔性能研究

Preparation Technology of ZnO Film and Its Barrier Performance via RF Magnetron Co-sputtering

目的为了解决普通聚合物包装塑料对水、氧的阻隔能力不足,以及包装内容物货架时间短等问题,研究氧化锌(ZnO)沉积复合薄膜制备工艺与阻隔性能之间的关系,探索其应用于包装材料的可行性。方法采用射频磁控溅射技术(RF),以ZnO为靶材,在PET塑料表面沉积制备氧化锌薄膜包装材料,并详细分析射频溅射功率、沉积时间与工作气压对ZnO复合薄膜微观形貌、沉积速率以及阻隔性能的影响。结果当溅射功率为150 W,沉积时间为30 min,工作气压为0.8 Pa时,ZnO薄膜均匀且致密,阻隔能力最强,其氧气透过率(OTR)降低为1.23 m L/(m2·d),水蒸汽透过率(WVTR)降低为0.382 g/(m2·d)。与相同厚度下的PET原膜相比,所制备的ZnO高阻隔薄膜的透氧率降低了49.5倍,透湿率降低了17.6倍。结论射频溅射参数通过影响复合薄膜的微观形貌、致密程度、沉积速率以及沉积层厚度等方面对其阻隔能力会产生较大影响。

The work aims to study the relationship between the preparation technology and the barrier property of zinc oxide（ZnO） deposited compound films and explore the feasibility of the films applied in the packaging materials, regarding the problems that the ordinary polymer packaging plastics have poor barrier property for water and oxygen and the shelf life of packaged objects is short, etc. ZnO films were prepared via RF magnetron sputtering on PET plastic surface with ZnO as the target material. The influence of RF sputtering power, deposition time and work pressure on the morphology, deposition rate and barrier properties of ZnO compound films was analyzed in detail. When the sputtering power was 150 W, the deposition time was 30 min and the work pressure was 0.8 Pa, the ZnO films were uniform and dense, with the strongest barrier property. The OTR of the film was 1.23 m L/（m2·d）, and the WVTR was 0.382 g/（m2·d）, which were respectively 49.5 and 17.6 times lower than the original PET film with the same thickness. The sputtering parameters will have a larger influence on the barrier property of the compound films by affecting their morphology, density, deposition rate and deposit thickness, etc.