羟基化处理对氮化硼膜耐原子氧性能的影响

Effects of Hydroxyl Treatment on Atomic Resistance Property of Hexagonal Boron Nitride Film

采用氢氧化钠溶液对六方氮化硼进行表面羟基化处理,以两种氮化硼和纤维素纳米纤维为原料通过真空抽滤层层自组装方法制备高氮化硼含量的柔性自支撑薄膜。在地面模拟空间环境中考察两种氮化硼膜的耐原子氧性能。结果表明:改性氮化硼膜比未改性膜的质量损失和剥蚀率分别下降了33%和38%。实验后两种薄膜表面呈现斑驳的"地毯状";主要元素发生了氧化,改性氮化硼膜中氧化硼含量更高;氮化硼晶体产生了晶格畸变。结合实验中两种氮化硼膜的行为变化,提出了其与原子氧的反应模型,分析了羟基化处理对氮化硼膜耐原子氧性能的影响。

Surface hydroxyl treatment of hexagonal boron nitride（hBN）was performed in sodium hydroxide aqueous solution.With hBN,hBN-OH and nanofibrillated cellulose fibers（NFC）,flexible free-standing high-content BN films were fabricated through vacuum filtration and LBL self-assembly methods.Their atomic oxygen resistance properties were evaluated in a ground-based simulation facility.The results show that mass loss and erosion yield（Ey）of hBN-OH/NFC film decline by 33% and 38% respectively compared with hBN/NFC film.After AO exposure,both films manifest carpet-like morphologies,elements oxidations and BN lattice distortions.And hBN-OH/NFC film possesses higher boron oxide content on the surface.Based on BN films responses,shielding AO models were put forward and influences of hydroxyl treatment on atomic resistance property of BN films were analysed.