N_2流量对反应共溅射TiN/Ni纳米复合膜结构和结合强度的影响

Effect of N_2 Flow Rate on Microstructure and Adhesion Strength of Reactive Magnetron Co-sputtered TiN/Ni Nanocomposite Films

以高纯Ti和Ni为靶材,在不同N_2气流量下反应磁控共溅射了TiN/Ni纳米复合膜,采用原子力显微镜、X射线衍射、X射线光电子能谱、场发射扫描电镜和划痕试验研究了N_2气流量对复合膜微结构、界面结合力和摩擦系数的影响。结果表明,共溅射TiN/Ni纳米复合膜组织细小、表面光滑、致密。TiN为fcc结构,其择优取向为(111)面。随N_2气流量增加,复合膜孔隙率、晶粒尺寸和沉积速率均出现不同程度的下降;而膜表面粗糙度先减小后增大,界面结合力则先提高后下降。本实验条件下,在N_2气流量为16mL/min时所沉积的复合膜表面粗糙度最小、界面结合力最好,分别为2.75nm和44.6N,此时复合膜的摩擦系数最低,为0.14。

A series of TiN/Ni nanocomposite thin films were deposited on Si（100）and 304 stainless steel substrates at different N2 flow rates by reactive magnetron co-sputtering on Ti and Ni targets.The N2 flow rate dependences of the microstructure,adhesion strength and friction coefficient of the deposited films were studied by using atomic force microscopy,X-ray diffraction,X-ray photoelectron spectroscopy,field emission scanning electron microscopy and scratch test.The TiN/Ni film has a fine microstructure,a smooth and dense surface,and an fcc structure with a dominant orientation of the（111）plane.The rise of N2 flow rate causes the declines in porosity,grain size and deposition rate,and the biphasic（increase→ decrease）changes of both surface roughness and adhesion strength of the resultant composite film.The smallest surface roughness,the highest adhesion strength and the lowest friction coefficient can be achieved by applying a N2 flow rate of 16 mL/min,and their values are 2.75 nm,44.6 Nand 0.14,respectively.