退火温度对多弧离子镀法制备TiO_2涂层显微结构与性能的影响研究

Effects of Annealing Temperature on the Micro-structure and Properties of TiO_2 Coating Prepared by Arc Ion Plating

本文采用多弧离子镀技术在玻璃基底上制备光催化性能良好的TiO_2涂层,并对TiO_2涂层分别进行400℃、500℃和600℃的退火处理并系统研究退火温度对涂层结构与性能的影响.使用X射线衍射(XRD)分析了不同退火温度时,TiO_2涂层晶体显微结构的变化.结果表明:当退火温度由400℃上升至600℃时,TiO_2涂层的晶体结构由锐钛矿相变成锐钛矿和金红石混晶相.使用扫描电镜(SEM)分析了不同温度退火处理的TiO_2涂层的表面形貌;随着退火温度升高,颗粒的尺寸变大.光催化实验结果表明,所得涂层具有良好光催化活性;涂层降解亚甲基蓝溶液的透光率随时间的增加而升高,经400℃退火的TiO_2涂层的光催化活性最高.

TiO2 coatings with good photocatalytic performance were prepared on the glass substrate by arc ion plating method.The TiO2 coating was annealed at 400 oC,500 ℃ and 600 ℃ respectively.The crystal structure of TiO2 coating was analyzed by X-ray diffraction（XRD）at different annealing temperatures.The results show that when the annealing temperature rises from 400 ℃ to 600 ℃,the crystal structure of TiO2 coating is changed from anatase phase to anatase and rutile mixed crystal phase.The surface morphology of TiO2 coating with different annealing conditions was analyzed by scanning electron microscopy（SEM）.As the annealing temperature increases,the grain size of the particles becomes larger.The results of photocatalytic experiments show that the obtained coating has good photocatalytic activity.The light transmittance of the degraded methylene blue solution increases with time.The photocatalytic activity of TiO2 coating annealed at 400 ℃is the highest.