工件位置对薄膜沉积速率的影响

Influence of Workpiece Position on Film Deposition Rate

研究发现在实际的DLC薄膜沉积过程中,薄膜的沉积速率与工件所处的位置有关,在同一装置内沿轴向取30 mm为间隔放置工件进行薄膜沉积,沉积一小时后三个工件表面薄膜沉积厚度依次为2.4μm、2.1μm、1.8μm。通过有限元模拟软件Ansys对这种现象进行了分析,沉积装置内部气体的压强和气体质量分数分布变化不大,而装置不同位置处工件表面气体流速和气体密度有明显的变化,三个工件表面气体流速依次为0.072~0.103 m/s,0.089~0.121 m/s,0.114~0.148 m/s,气体密度为6.37e^(-5)kg/m3,5.81e^(-5)kg/m3,5.18e^(-5)kg/m3。因此,在沉积过程中,不同位置处的薄膜沉积速率的主要影响因素是气体流速和气体密度。

It is found that the mass of deposited film is related to the position of the work piece in the container during the deposition process of DLC film. The film deposition was carried out at intervals of 30 mm in the same apparatus. After one hour of deposition the thickness of the three films deposited was 2.4 μm,2. 1 μm and 1. 8 μm. The simulation result by using the finite element simulation software ANSYS shows something different in the despositon device. It turns out that the inner gas pressure and inner gas mass fraction change little while the inner gas flow rate and inner gas density on workpiece surface within different locations in the device. The gas flow rates of the three workpiece surfaces were 0. 072-0. 103 m/s,0. 089-0. 121 m/s,0. 114-0. 148 m/s,the gas density was 6. 37 e-5 kg/m3,5. 81 e-5 kg/m3,5.18 e-5 kg/m3. Therefore,it can be speculated that the rate of the film during the depositon process is mainly influenced by the gas flow rate and gas density.