摘要
利用拉曼光谱研究了He^(2+)注入六方SiC晶体样品时的损伤缺陷随注量的变化关系,并采用直接碰撞/缺陷模拟模型与多级损伤累积模型,模拟了室温及723,873,1023K下晶体样品的无序度随注量的变化关系。测试结果表明:随着注量的增加,晶体样品无序度增大,样品的拉曼特征峰强度减小。
Raman spectroscopy is used to study the relationship between the injection damage defect and the fluence of He 2+ implanted hexagonal SiC crystals. Two models are used to simulate the relationship between the disorder of He 2+ implanted hexagonal SiC crystals and the fluence at room temperature, 723 K, 873 K and 1 023 K. The results show that the disorder increases and the intensity of Raman charateristic peaks decreases with the increase of fluence.
作者
韩驿
彭金鑫
李炳生
王志光
魏孔芳
刘会平
张利民
HAN Yi;PENG Jin-xin;LI Bing-sheng;WANG Zhi-guang;WEI Kong-fang;LIU Hui-ping;ZHANG Li-min(Institute of Modern Physics,Chinese Academy of Sciences,Lanzhou 730000,China;University of Chinese Academy of Sciences,Beijing 100049,China;The School of Nuclear Science and Technology,Lanzhou University,Lanzhou 730000,China)
出处
《现代应用物理》
2018年第3期45-50,共6页
Modern Applied Physics
基金
国家自然科学基金资助项目(11475229)
关键词
碳化硅
离子注入
拉曼光谱
损伤累积
SiC
He ion implantation
Raman spectroscopy
damage accumulation