Temperature dependence on the electrical and physical performance of InAs/AlSb heterojunction and high electron mobility transistors

In this report, the effect of temperature on the In As/Al Sb heterojunction and high-electron-mobility transistors（HEMTs） with a gate length of 2 μm are discussed comprehensively. The results indicate that device performance is greatly improved at cryogenic temperatures. It is also observed that the device performance at 90 K is significantly improved with 27% lower gate leakage current, 12% higher maximum drain current, and 22.5% higher peak transconductance compared to 300 K. The temperature dependence of mobility and the two-dimensional electron gas concentration in the In As/Al Sb heterojunction for the temperature range 90 K-300 K is also investigated. The electron mobility at 90 K（42560 cm2/V·s）is 2.5 times higher than its value at 300 K（16911 cm^2/V·s） because of the weaker lattice vibration and the impurity ionization at cryogenic temperatures, which corresponds to a reduced scattering rate and higher mobility. We also noted that the two-dimensional electron gas concentration decreases slightly from 1.99 × 10^（12） cm^（-2） at 300 K to 1.7 × 10^（12） cm^（-2） at 90 K with a decrease in temperature due to the lower ionization at cryogenic temperature and the nearly constant ？Ec.