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Ab initio study of H/O trapping and clustering on U/Al interface

Ab initio study of H/O trapping and clustering on U/Al interface
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摘要 Al coating on U surfaces is one of the methods to protect U against environmental corrosion. The behaviors of hydrogen and oxygen impurities near the Al/α-U interface have been studied in the density functional theory framework. It turns out that U vacancies tend to segregate to the interface with segregation energies of around 0.5-0.8 eV. The segregated U vacancy can act as a sink for H and O impurities, which is saturated when filled with 8 H or 6 O atoms, respectively.Moreover, the O impurities tend to stay in the Al layer while the H impurities prefer to diffuse into the U lattice, suggesting that the Al coating can play a significant role against oxidation but not against hydrogenation of U. Al coating on U surfaces is one of the methods to protect U against environmental corrosion. The behaviors of hydrogen and oxygen impurities near the Al/α-U interface have been studied in the density functional theory framework. It turns out that U vacancies tend to segregate to the interface with segregation energies of around 0.5-0.8 eV. The segregated U vacancy can act as a sink for H and O impurities, which is saturated when filled with 8 H or 6 O atoms, respectively.Moreover, the O impurities tend to stay in the Al layer while the H impurities prefer to diffuse into the U lattice, suggesting that the Al coating can play a significant role against oxidation but not against hydrogenation of U.
作者 欧阳文泓 赖文生 张政军 Wenhong Ouyang;Wensheng Lai;and Zhengjun Zhang(Laboratory of Advanced Materials,School of Materials Science and Engineering,Tsinghua University,Beijing 100084,China)
出处 《Chinese Physics B》 SCIE EI CAS CSCD 2018年第9期512-517,共6页 中国物理B(英文版)
基金 Project supported by Science Challenge Project of China(Grant No.TZ2016002) the National Key R&D Program of China(Grant No.2017YFB0702201)
关键词 INITIO 接口 学习 聚类 氧杂质 环境腐蚀 分离 原子时 interface uranium aluminum density functional theory
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