多晶硅生产中氯硅烷残液的回收处理工艺的研究进展

Research Progress on Recovery and Treatment of Chlorosilane Residue in Polysilicon Production

多晶硅生产过程中,氯硅烷残液的回收处理是一个难题。本文介绍了氯硅烷残液的来源和主要组分,概述多晶硅生产中副产物氯硅烷残液的处理方法,包括水解法、过滤法、干燥法、燃烧法和萃取法等,并对这些处理方法的的优缺点进行了深入探讨。最后,展望了各种处理方法的应用前景,提出处理氯硅烷残液需要多种方法结合运用,才能收到良好的处理效果。

In the production process of polysilicon, the recovery of chlorosilane residue solution was a difficult problem. In this paper, the sources of chlorosilane residual liquid and its main components were introduced. The treatment method of chlorosilane residual liquid, included hydrolysis, filtration, drying and burning method and extraction method, were reviewed. The advantages and disadvantages of these treatment methods were discussed. Finally, the application prospect of various treatment methods was prospected, and it was pointed out that the treatment of residual liquid of chlorosilane needed a combination methods to achieve a good treatment effect.