氧含量对磁控溅射FTO透明导电薄膜结构与性能的影响

Influence of Oxygen Content on Structure and Properties of FTO Thin Films by Magnetron Sputtering

采用磁控溅射法在玻璃衬底上制备了FTO透明导电薄膜.通过X射线衍射(XRD)、紫外可见光谱(UVvis)、双电测四探针仪和霍尔效应测试系统对薄膜的结构和性能进行了表征.实验结果表明:氧含量的变化能改变FTO薄膜的晶体结构和光电性能,当溅射氩气中通入4%含量的氧气时,可得到性能最佳的金红石相FTO薄膜,所得薄膜可见光透过率高达90%以上,电阻率降至7. 8×10-4Ω·cm.并且,FTO薄膜的吸收限产生蓝移,且蓝移程度随氧含量的改变而有所不同.

With the development of the aerospace industu, the development of high-temperature titanium alloys has become a focus. Through the study of the structural phases of titanium alloys, the principle of the microstructure of high-temperature titanium alloys was described. The development of various types of titanium alloys was introduced.