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Temperature Dependence of Electrical Characteristics in Indium-Zinc-Oxide Thin Film Transistors from 10 K to 400 K

Temperature Dependence of Electrical Characteristics in Indium-Zinc-Oxide Thin Film Transistors from 10 K to 400 K
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摘要 The transfer characteristics of amorphous indium-zinc-oxide thin film transistors are measured in the temperature range of 10-400K. The variation of electrical parameters (threshold voltage, field effect mobility, sub-threshold swing, and leafage current) with decreasing temperature are then extracted and analyzed. Moreover, the dom- inated carrier transport mechanisms at different temperature regions are investigated. The experimental data show that the carrier transport mechanism may change from trap-limited conduction to variable range hopping conduction at lower temperature. Moreover, the field effect mobilities are also extracted and simulated at various temperatures. The transfer characteristics of amorphous indium-zinc-oxide thin film transistors are measured in the temperature range of 10-400K. The variation of electrical parameters (threshold voltage, field effect mobility, sub-threshold swing, and leafage current) with decreasing temperature are then extracted and analyzed. Moreover, the dom- inated carrier transport mechanisms at different temperature regions are investigated. The experimental data show that the carrier transport mechanism may change from trap-limited conduction to variable range hopping conduction at lower temperature. Moreover, the field effect mobilities are also extracted and simulated at various temperatures.
作者 刘远 王黎 蔡述庭 陈雅怡 陈荣盛 熊晓明 耿魁伟 Yuan Liu;Li Wang;Shu-Ting Cai;Ya-Yi Chen;Rongsheng Chen;Xiao-Ming Xiongl;Kui-Wei Geng(School of Automation,Guangdong University of Technology,Guangzhou 510006;School of Electronic and Information Engineering,South China University of Technology,Guangzhou 510640;Key Laboratory of Silicon Device Technology,Chinese Academy of Sciences,Beijing 100029)
出处 《Chinese Physics Letters》 SCIE CAS CSCD 2018年第9期95-98,共4页 中国物理快报(英文版)
基金 Supported by the National Natural Science Foundation of China under Grant No 61574048 the Pearl River S&T Nova Program of Guangzhou under Grant No 201710010172 the International Science and Technology Cooperation Program of Guangzhou under Grant No 201807010006 the Opening Fund of Key Laboratory of Silicon Device Technology under Grant No KLSDTJJ2018-6
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