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脉冲电沉积Ni-Cr复合电镀工艺研究

Study on Pulse Electrodeposited Ni-Cr Composite Plating Process
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摘要 研究了脉冲电沉积Ni-Cr复合电镀工艺,通过实验获得脉冲镀铬毛化工艺最佳条件:占空比80%,电流密度45A/dm2,温度50℃,电镀时间30min。在此条件下,镀铬层的表面粗糙度达到了最大值,大约是8.341 3μm,镀层的硬度为1 093HV,耐磨性良好,结合力合格,无起皮或者脱落,可以获得理想的毛化表面。 The pulse electrodeposition Ni-Cr composite plating process was studied.The optimum conditions of pulse chromium texturing process were obtained by experiments:duty cycle 80%,current density range 45A/dm2,temperature 50℃,plating time 30 min.Under these conditions,the surface roughness Ra of the chromium plating layer reaches the maximum value,about 8.3413 micron,the hardness of the coating is 109 3 HV,good wear resistance,good adhesion,no peeling or shedding,and the ideal textured surface can be obtained.
作者 公秀凤 Gong Xiu-feng
出处 《化工设计通讯》 CAS 2018年第10期87-87,124,共2页 Chemical Engineering Design Communications
关键词 脉冲电镀 镀铬 粗糙度 pulse plating chromium plating roughness
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