偏摆式平面研磨抛光轨迹的理论研究

Theoretical study on trajectory of swinging plane lapping and polishing

为分析偏摆式平面研磨抛光中偏摆运动参数对研磨抛光轨迹的影响规律,建立运动轨迹模型,用轨迹非均匀性定量方法进行评价。结果表明:偏摆幅度和偏摆角度对轨迹非均匀性影响显著,而偏摆角速度(取到非特殊值时)对轨迹非均匀性影响很小。当偏摆幅度和偏摆角度分别为15mm和30°左右时,轨迹非均匀性明显改善,其值可减小到0.058;而选择不当的偏心距和偏摆运动参数时,其值可达0.284。

To analyze the influences of swinging motion parameters on lapping and polishing trajectory in plan lapping and polishing with swinging motion,a model on movement trajectory is established,and the quantitative evaluation method of trajectory non-uniformity is used.The results show that the swinging amplitude and the swinging angle have an obvious influence on the trajectory non-uniformity,while the swinging angular velocity has little effect on trajectory non-uniformity except that the swinging angular frequency takes a special value.The trajectory non-uniformity can be well improved when the swinging amplitude is 15 mm and the swinging angle is 30°,whose value can be reduced to0.058.If the values of the eccentricity and swinging motion parameters are improperly selected,the value of trajectory non-uniformity can be up to 0.284.