金属硅中氮含量分析方法研究

Study on Analytical Methods of Nitrogen Content in Silicon Metal

研究了ONH836氧氮氢测定仪测定金属硅中氮含量的测定方法。通过正交试验分析了主要因素及水平对测定结果的影响,确定了最佳分析条件。最佳分析条件为采用座坩埚,称样质量为0. 05～0. 15g,分析功率为4500W。该方法测定下限为0. 0020%。分析了该测试方法的精密度及准确度。采用该方法测定硅中氮得到的RSD <6%;加标回收率在92%～112%之间,满足分析测试准确度要求。

The method for the determination of nitrogen content in metallic silicon by ONH836 Oxygen/Nitrogen/Hydrogen Elemental Analyzer was studied.The Main Influence Factors and levels on the determination results was analyzed by Orthogonal array testing,the best analytical conditions were determined.The best analysis conditions were the use of pedestal crucible,the sample weight is 0.05~0.15g,and the analysis power is 4500W.The lower limit of the method is 0.0020%.The precision and accuracy of the test method are analyzed.The method is used to determine the nitrogen RSD〈6% in silicon,and the recovery rate is 92%~112%,which meets the accuracy requirement of analytical test.