脉冲电弧离子源镀膜均匀性的研究

Study on the Deposition Uniformity of Pulsed Arc Ion Source

镀膜均匀性是脉冲真空电弧离子源应用需要解决的一个重要问题。本文首先分析了在脉冲真空电弧离子镀膜过程中 ,采用不同阴极尺寸、不同辅助阳极尺寸引起所镀膜层透过率曲线的改变 ,进而讨论了脉冲真空电弧离子源电极几何尺寸对膜厚均匀性的影响。在基片下加一个圆筒形负电位电极 ,实现了脉冲真空电弧离子源镀膜的均匀性。实验结果表明 ,采用这一技术 ,在 70mm范围内 ,基片透过率的相对变化可达到± 6.

Film uniformity is an important problem in application of pulsed vacuum arc ion source. Experiments were conducted to investigate the uniformity of the film deposited by the pulsed vacuum arc ion source. The influence of the cathode size, and the assistant anode size on the uniformity of the film thickness was studied and the results, the influence of the geometric size of the electrodes of the pulsed vacuum arc ion source on the film thickness unifor mity were analyzed. Excellent film thickness uniformity was achieved by using a cylindrical electrode having negative potential under the substrate, its relative variety within  70 mm is ±6.8%.