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Electron Temperature Control in Inductively Coupled Nitrogen Plasmas by Adding Argon/Helium

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出处 《Chinese Physics Letters》 SCIE CAS CSCD 2002年第8期1139-1140,共2页 中国物理快报(英文版)
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参考文献10

  • 1Hong J I, Seo S H, Kim S S, Yoon N S, Chang C S and Chang H Y 1999 Phys. Plasmas 6 1017
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  • 4Chung C W, Kim S S, Seo S H, Chang H Y and Yoon N S 2000 J. Appl. Phys. 88 1181
  • 5Gorse C, Benedictis S D, Dilecce G and Capitelli M 1990 Spectrochim. Acta 45B 521
  • 6Capitelli M, Celiberto R, Gorse C, Winkler R and Wilhelm J 1987 J. Appl. Phys. 62 4398
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  • 9Haas F A, Goodyear A and Braithwaite N S J 1998 Plasma Sources Sci. Technol. 7 471
  • 10Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Materials Processing (New York:Wiley)

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