ZnO薄膜生长技术的最新研究进展

Advances in Research on Deposition Techniques for ZnO Thin Films

ZnO是一种新型的Ⅱ-Ⅵ族半导体材料,目前已研究开发了许多ZnO薄膜的生长技术。其中,磁控溅射、喷雾热分解、分子束外延、激光脉冲沉积、金属有机物化学气相外延等沉积技术得到了有效应用;而一些新的工艺方法,如溶胶-凝胶、原子层处延、化学浴沉积、离子吸附成膜、离子束辅助沉积、薄膜氧化等也进行了深入研究。详细阐述了ZnO薄膜生长技术的最新研究进展。

Zinc oxide is a novel material for Ⅱ-Ⅵ semiconductor.A number of deposition techniques for ZnO thin films are now available,such as magnetron sputtering,spray pyrolysis,molecular beam epitaxy,pulsed laser deposition,metal-organic chemical vapor deposition and some novel growth technologies,including sol-gel,atomic layer epitaxy,chemical bath deposition,ion beam assisted deposition,successive ion layer adsorption and reactions,film oxidation,and so on.In this work,advances in research on deposition techniques for ZnO thin films are reviewed in detail.