低温直流磁控溅射制备ITO薄膜工艺研究

The study on the process Of ITO thin films deposited by DC magnetron sputtering at Low temperature

采用低温直流磁控溅射法针对附有有机聚合物玻璃磁控镀制ITO薄膜,通过四探针、紫外可见分光亮度计对样品进行表征,研究了基底温度、溅射功率对ITO薄膜光电性能影响,试验表明:在附有有机聚合物的玻璃上低温直流磁控溅射法制备ITO薄膜,随着基底温度的增加方块电阻先下降后增加,透过率先增加后略微减少;随着溅射功率的增加,薄膜方块电阻减少,透过率降低。

ITO thin films were deposited on glass coating with organic polymer by Dc magnetron sputtering method under low-temperature,The effects of DC power and the substrate temperature on the electrical and optical properties of the ITO thin films were studied by four-point probe,UV-vis spectrometer. The results show that on the glass with organic polymer dc magnetron sputtering of ITO thin films prepared by low temperature,with the substrate temperature increasing,the sheet resistance of ITO film drop initially and then increased,transmittance of ITO film increased firstly and then decreased; As the increase of sputtering power,the sheet resistance of ITO film decreased,transmittance of ITO films decreased.