Al靶电流对复合离子镀TiAlCN薄膜组织结构与性能的影响

Effect of Al Target Current on Structure and Properties of TiAlCN Films Prepared by Composite Ion Plating

TiAlCN集TiAlN和TiCN优良特性,作为一种新型硬质薄膜材料具有重要应用,目前研究主要集中在单一工艺下薄膜的组织结构和力学性能,对于薄膜耐蚀性的研究鲜有报道。通过复合离子镀技术制备了一系列TiAlCN薄膜,着重研究了Al靶电流对薄膜组织结构与性能的影响规律。结果表明:不同Al靶电流下制备的TiAlCN薄膜表面光滑、平整,组织结构致密,适当增大靶电流可使薄膜表面颗粒、凹坑及针孔等缺陷数量减少,表面形貌得到改善; TiAlCN薄膜形成fcc-TiN型(Ti,Al)(C,N)相为主的多相混合结构,且随着Al靶电流的增大,薄膜发生生长取向的转变; TiAlCN薄膜的平均硬度与弹性模量随Al靶电流的升高先增大后减小,在靶电流60 A时达到最大值,分别为36.8 GPa和410 GPa,显著高于SS304的4.8 GPa和150 GPa; SS304表面镀覆TiAlCN薄膜后其自腐蚀电位上升,自腐蚀电流密度减小,随着Al靶电流的增加,薄膜的耐腐蚀性能逐渐提高,靶电流为60 A所得薄膜的自腐蚀电流密度和极化电阻分别为0.129μA/cm^2和430.500 kΩ·cm^2,腐蚀速率最小,具有良好的耐腐蚀性能。

A series of TiAlCN films were prepared by the composite ion plating technique. The effect of Al target current on the structure and properties of TiAlCN films was investigated. Results showed that the surface of TiAlCN films with different Al target currents was smooth,uniform and dense. The quantities of particles,pits and pinholes on the film surface were reduced by increasing the target current appropriately,which could improve the surface morphology of films. A fcc-TiN type( Ti,Al)( C,N) poly-phase mixture structure dominated in the films and the growth orientation of the films changed with the increase of the Al target current. The average hardness and elastic modulus of TiAlCN films increased first and then decreased as the Al target current increased,reaching to a maximum value of 36.8 GPa and 410 GPa at a target current of 60 A,respectively,which were higher than those of SS304( 4.8 GPa and 150 GPa) significantly. The corrosion potential of TiAlCN-coated SS304 shifted positively and the corrosion current density decreased sharply,improving the corrosion resistance of the films gradually with an increase of the target current. When the target current was 60 A,the films had the lowest corrosion rate and the most excellent corrosion resistance with the corrosion current density of 0.129 μA/cm^2 and the polarization resistance of 430.500 kΩ·cm^2,respectively.