摘要
SiO_2:F薄膜作为low-e玻璃的功能层材料,广泛应用于节能镀膜玻璃。对帮化学气相沉积法在玻璃表面沉积的约250 nm厚的SiO_2:F薄膜进行不同气氛的退火处理。结果发现,薄膜的电学、光学性能在氦气和空气两种不同的退火气氛下会有显著的变化。SiO_2:F薄膜的Low-e性能经过空气中高温退火下降明显。但在空气中退火后,再在氮气保护下退火,性能会有所恢复。对该现象的机理也进行了研究。
The SnO_2:F thin films with low-emission property have been widely used as a dominating kind of energy saving glass.Different annealing approaches were carried out on the as-deposited SnO_2:F(~250 nm,with ~20 nm SiO_2 barrier on glass substrate) thin films.It is found that the electrical and optical characteristics are significantly influenced by annealing atmosphere.The low-emission property of SnO_2:F decreases sharply after post annealing in air,while partly recovers after annealing in air followed by annealing in nitrogen.In addition,the mechanism has also been successfully uncovered.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2012年第S3期304-309,共6页
Rare Metal Materials and Engineering
基金
NSFC(50824001)
