生物医用金属钽涂层制备及性能

Deposition and Properties of Ta Coating as Biomedical Material

本研究采用常压化学气相沉积技术在平面和多孔钛合金基体上制备了金属钽涂层。反应原料为化学纯的五氯化钽,以高纯氢气作为还原气体及载气,将蒸发后的五氯化钽输送到高温沉积区,通过还原反应生成金属钽,并沉积在钛合金表面。通过X射线衍射仪、扫描电子显微镜和摩擦磨损试验机等设备对涂层进行表征。结果表明,钽涂层不仅可以沉积在平面钛合金表面,还可以沉积在多孔基体的外表面及内表面,而氢气流量和沉积温度均显著影响钽涂层的表面形貌及性能。经过实验参数的优化,钽涂层与钛合金基体有较佳的结合力,满足植入条件的要求。本研究结合了钛合金相对低廉的成本和金属钽优异的生物特性,为多孔钽在医疗领域的广泛应用提供了支持。

High quality Ta coating was made on porous and plate Ti6Al4 V alloy by atmospheric pressure chemical vapor deposition(APCVD). Analytically pure TaCl5 powders were used as reactant source and high-purity H2 gas was adopted as both reductant and carrier gas in the deposition process. Ta coating was fabricated on the surface of Ti alloy through the deacidization of TaCl5 compound flow. The morphology, microstructure and phase composition were characterized by scanning electron microscopy(SEM), X-ray diffraction(XRD) and energy-dispersive spectroscopy(EDS). Ta coating was deposited not only on the plate substrates, but also on both the outer and inner surface of porous Ti6Al4 V substrate. It is found that the morphology of the Ta coating is affected by both gas flow and substrate temperature(Ts). With the optimal parameter, the adhesion strength is enough for implant. The investigations combine the relative low cost of Ti alloy and the excellent biocompatibility of Ta, which is promising for a wide variety of clinical applications.