无掩模定域性电沉积-增材制造技术研究进展

Research Progress of Maskless Localized Electrodeposition-Additive Manufacturing Technology

无掩模定域性电化学沉积-增材制造技术是采用电化学沉积原理、摈除掩模与支撑、以增材制造方式实现三维金属微结构制造的一种新技术。本文综述了体现该技术核心内容与工艺特征的代表性技术:介绍了无掩模定域性喷射电化学沉积-增材制造技术和无掩模定域性直写电化学沉积-增材制造技术的基本原理和研究现状,分析了2种技术各自的特点、存在的问题和今后的研究发展趋势。

Maskless localized electrochemical deposition-additive manufacturing technology is a new technique for manufacturing three-dimensional micro metal structures by applying electrochemical depositing principles and additive manufacturing methods without reliance on support or mask. The representative techniques which embody the core content and process features of the new technology were reviewed in this paper. The basic principles and research progres s of the technology of maskless localized jet electrochemical deposition-additive manufacturing(Maskless Jet ECD-AM) and maskless localized direct writing electrochemical deposition-additive manufacturing(Maskless Direct Writing ECD-AM) were introduced. The characteristics, existing problems and future research trends of them were analyzed.