Silicon Film Fabrication by Liquid Phase Epitaxy at Low Temperature

ＳｉｌｉｃｏｎＦｉｌｍＦａｂｒｉｃａｔｉｏｎｂｙＬｉｑｕｉｄＰｈａｓｅＥｐｉｔａｘｙａｔＬｏｗＴｅｍｐｅｒａｔｕｒｅ①ＱＩＡＮＹｏｎｇｂｉａｏ，ＳＨＩＷｅｉｍｉｎ，ＣＨＥＮＰｅｉｆｅｎｇ，ＭＩＮＪｉａｈｕａ，ＧＵＹｏｎｇｍｉｎｇ，ＧＵＯＹａｎｍｉｎｇ...

Low temperature liquid phase epitaxy of silicon thin films was successfully carried out at a temperature of (400～500)℃,using Au/Bi alloy as a Si-saturated Sn solution was used to protect the substrate surface,preventing effectively the oxidation of silicon.The grown Si thin films were identified by SEM,AES and C-V measurements.