摘要
薄膜制备过程中溅射靶材的利用率很低,导致薄膜材料制备成本很高。以自制的高纯度纳米晶镍锌钴/二氧化硅复合铁氧体粉体为原料,冷等静压后高温烧结制备得到铁氧体复合靶材。用XRD、EPMA和SEM分析靶材的化学成分和微观形貌。结果表明:靶材为镍锌钴铁氧体和二氧化硅的复合材料,收缩率达14.37%,能在高真空多功能磁控溅射仪正常工作,并成功制备得到性能良好的软磁薄膜。整个制备过程工艺简单,操作方便可行,大大降低了靶材的制备成本。
The target are prepared with composites by cold isotatic pressing and sintered at high temperature.XRD and SEM are used to characterize the target.The results show that target is com- plex materials of NiCoZn Ferrite and SiO2.The shrinkage ratio of target is 14.37% and the target can be used to sputtering in the magnetron sputter.The soft magnetic film is successfully deposited on the silicon.The whole preparation is simple and the cost of target is low.
出处
《现代职业教育研究》
2006年第3期12-14,共3页
Research on Modern Vocational Education
