化学气相沉积金刚石薄膜衬底的研究进展

Development of Study on Substrate Materials of Diamond Films by Chemical Vapor Deposition

讨论了化学气相沉积金刚石薄膜的各种衬底材料。气相合成金刚石衬底材料分为 3类 ,第一类是能和碳形成碳化物的衬底 ;第 2类是与碳不起反应 (不形成碳化物 )但能溶碳的衬底 ;第 3类是既不与碳反应又不溶碳的衬底。第一种一般与金刚石薄膜有比较好的粘合性 ,后两种虽然使金刚石成核容易 ,但衬底材料与金刚石薄膜结合性较差。

In this paper,substrate materials of diamond films by chemical vapor deposition are discussed.There are three substrate categories.The first is that can form carbides and has good adhesion to diamond films.The second is that does not react with carbon but can dissolve it.The last is that neither react with carbon nor dissolve it.The latter two categories facilitate diamond nucleation but result in poor adhesion.The pre-treatment is important in improving nucleation and adhesion.