Ferromagnetic Resonance Study on the Permalloy Submicron Rectangular Arrays Prepared by Electron Beam Lithography

电子束光刻亚微米矩形阵列的坡莫合金薄膜铁磁共振谱的研究(英文)

In this paper, we report a ferromagnetic resonance study on the permalloy film of submicron sized rectangular arrays prepared by electron beam lithography and the theoretical simulation to the non uniform demagnetizing effect and ferromagnetic resonance data. By theoretical simulation, the magnetization, gyromagnetic ratio and g value of the sample are determined. The theoretical curves of the dependence of the resonance field on the field orientation φ H fit well with the experimental data. When the steady magnetic field is applied near the film normal, a series of additional regular peaks (up to eight ) appeared in the FMR spectrum on the low field side of the main FMR peak. The resonance field of these side peaks decreases linearly with the peak number. The possible physical mechanism of these multiple peaks was discussed.

报告了对电子束刻蚀的亚微米矩形阵列坡莫合金NiFe薄膜系统的铁磁共振 (FMR)研究及对矩形阵列不均匀退磁场和铁磁共振谱进行的理论拟合 .计算出样品的有效磁化强度M ,回旋磁比γ以及兰德因子g等参数 ,并且得出了共振场与所加磁场方位关系的理论曲线 .结果与实验曲线一致 .研究证明矩形单元导致了单轴平面磁各向异性 .本文还发现了在外磁场加在垂直于膜面的方向时 ,在主共振峰的低场侧出现了一系列规则的卫星峰 。