多弧离子法制备的Ti（C,N）微结构随C₂H₂/N₂流量比变化的研究（英文）

STUDY OF THE MICROSTRUCTURE OF TI(C,N) FILM PREPARED BY MULTI-ARC ION-PLATING

用多弧离子法在高速钢（W18Cr4V）基底上沉积了Ti（N,C）薄膜,并运用SEM、XRD、XPS对该膜微观结构随进气流量比r=C2H2/N2变化的情况进行了测试和分析。结果表明薄膜随r增加趋于致密,在r值较小时呈现较强的（111）择优取向,随着r值增大,（111）这一取向逐渐变弱,（220）取向渐强,薄膜呈现典型面心立方结构,主要成分为复合相Ti（N,C）,膜含有少量石墨相成分存在。

The Ti (C, N) multi-component coatings are deposited on the HSS steel (W18Cr4V) substrates by muti - arc ion - plating with variationg of reactive gas flow ratio r=C2H2/N2, and the coatings are tested and analysed by XPS, XRD , SEM techniques , The results show that the Ti ( C, N ) coating exhibits a very-strong (111) preferred orientation when the value of r is very low. The (111) peak decreases and (220) peak increases with the increasing of r while the coating becomes more dense . The film shows typical face - centered cubic structure . The component of the film is Ti ( C, N), but there is little graphite component in the coating.