摘要
论述了半导体光催化反应机理 ,从晶相组成、晶粒尺寸、热处理温度及气氛、表面羟基、表面结构等方面介绍了对催化剂活性的影响 ,探讨了反应物、氧气、p H值、温度、氧化剂、阴离子、光及光强等在光催化氧化降解过程中的作用 。
The mechanism of semiconductor photocatalysis is described. The factors affecting the photocatalytic activity, such as crystal phase, crystal grain size, thermal treatment temperature and atomosphere, surface hydroxyl groups and surface structure, are introduced. The influence of reactant and oxygen concentration, pH value, reaction temperature, type of oxidant and anion, type of light irradiation and its intensity on degradation efficiency is discussed. The future application of photocatalysis is prospected.
出处
《化学世界》
CAS
CSCD
北大核心
2002年第9期494-498,共5页
Chemical World
