摘要
当集成电路制造工艺线宽进入亚微米领域时，精确、稳定的测试亚微米、深亚微米线宽／间距尺寸，将成为重要而迫切的研究课题。本文主要阐述以光学原理为基础的共焦显微技术，以及利用共焦技术制造的LWM200型测试仪的性能，测试0．5μm，0．3μm的黑／白条宽，及其仪器测试性能分析。
A precise and stable measuring of sub - micron CD or even deep sub - micron CDwill become a very important and impending researehing subject. In this article, discussedmainly on the principles of the confocal thecroo - tech based on optic principles, and the usageof the LWM200 Mode instrument made by such principles, as well the measurements of bothCDs 0. 5μm 0. 3μm and the analysis of the instrumnt.
出处
《微电子技术》
1999年第1期31-38,共8页
Microelectronic Technology
