摘要
集成电路工艺监测版PCM(ProcessingControol,Monitor)在双极IC中应用广泛。它至少应该有四种基本的功能:测量元器件的特性,监控制造工艺能力,发现寄生效应以及工艺中的随机缺陷。在实践的基础上,本文提出了设计PCM的主要原则:适应性,可测性,覆盖范围和甄别性。
The Processing Control Monitor (PCM) was widely used in bipolar IC. PCMshould have four basic functions at least, i. e. to measure the chareteristics of all kinds ofcomponents, to monitor the processing ability of manufacturing, to discover the Palasitic effects and random defects occurred in processing. Based on practice in the paper, four pri-mary principles of design for PCM were presented, i. e. adaptability measudsility, covering range and discrimination.
出处
《微电子技术》
1999年第4期40-43,共4页
Microelectronic Technology
关键词
工艺监测版
元器件特性
制造工艺能力
随机缺陷
寄生效应
Processing Control Monitor (PCM)
Characteristics of Components
Processing Ability of Manufacturing
Random Defects
Parasitic effects