摘要
ZnO是一种新型的Ⅱ-Ⅵ族宽禁带(3.37eV)化合物半导体材料,具有较高的激子束缚能(室温下为60meV)和光增益系数320cm-1,是一种理想的短波长光电器件材料,在蓝紫光发光二极管(LEDs)和激光器(LDs)等领域有巨大的应用潜力。该文就ZnO薄膜的制备方法和应用做一简要综述。
ZnO is a novel Ⅱ-Ⅵ group wide bandgap(3.37eV) compound semiconductor materials with high exciton binding ener gy(at room temperature 60meV) and optical gain coefficient 320cm-1,is an ideal short wavelength optoelectronic device material,in blue-violet light emitting diodes(LEDs) and lasers(LDs) and other areas have great potential applications.In this paper,ZnO film preparation method and application to do a brief overview.
出处
《电脑知识与技术（过刊）》
2013年第2X期1209-1210,共2页
Computer Knowledge and Technology
关键词
ZNO薄膜
应用
功能器件
ZnO thin films
applications
functional devices
