摘要
The electron stimulated desorption was used to measure the surface diffusivity of atomic deuterium on clean and boron modified Ni 3(Al, Ti)(110) surfaces. Boron dosing was performed using a solid state boron ion source. Earlier studies showed that boron dissociates water readily at temperatures as low as 130?K and that the resulting atomic hydrogen is bound to the surface strongly. The surface diffusion coefficient of atomic D on 0.05 monolayer boron modified surface was measured to be about 10 times smaller than that on the clean surface. This slower diffusion of atomic hydrogen may explain why boron improves the ductility of polycrystalline Ni 3Al in moist environments.
The electron-stimulated desorption was used to measure the surfacediffusivity of atomic deuterium on clean and boron-modified Ni_3(Al, Ti) (110) surfaces. Borondosing was performed using a solid-state boron ion source. Earlier studies showed that borondissociates water readily at temperatures as low as 130 K and that the resulting atomic hydrogen isbound to the surface strongly. The surface diffusion coefficient of atomic D on 0.05 monolayerboron-modified surface was measured to be about 10 times smaller than that on the clean surface.This slower diffusion of atomic hydrogen may explain why boron improves the ductility ofpolycrystalline Ni_3Al in moist environments.
出处
《中国有色金属学会会刊：英文版》
EI
CSCD
2002年第4期649-652,共4页
Transactions of Nonferrous Metals Society of China
基金
ThisworkissupportedbytheNationalScienceFoundationofUSA
grantNo .DMR 97130 5 2 .
