期刊文献+

为一只双隧道的 4H 硅碳化物金属半导体地效果晶体管降低效果和优化的导致排水管的障碍当模特儿

Modeling of the drain-induced barrier lowering effect and optimization for a dual-channel 4H silicon carbide metal semiconductor field effect transistor
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摘要 A new analytical model to describe the drain-induced barrier lowering(DIBL) effect has been obtained by solving the two-dimensional(2D) Poisson’s equation for the dual-channel 4H-SiC MESFET(DCFET).Using this analytical model,we calculate the threshold voltage shift and the sub-threshold slope factor of the DCFET,which characterize the DIBL effect.The results show that they are significantly dependent on the drain bias,gate length as well as the thickness and doping concentration of the two channel layers.Based on this analytical model,the structure parameters of the DCFET have been optimized in order to suppress the DIBL effect and improve the performance. A new analytical model to describe the drain-induced barrier lowering(DIBL) effect has been obtained by solving the two-dimensional(2D) Poisson’s equation for the dual-channel 4H-SiC MESFET(DCFET).Using this analytical model,we calculate the threshold voltage shift and the sub-threshold slope factor of the DCFET,which characterize the DIBL effect.The results show that they are significantly dependent on the drain bias,gate length as well as the thickness and doping concentration of the two channel layers.Based on this analytical model,the structure parameters of the DCFET have been optimized in order to suppress the DIBL effect and improve the performance.
出处 《Chinese Physics B》 SCIE EI CAS CSCD 2012年第3期395-399,共5页 中国物理B(英文版)
基金 Project supported by the Pre-research Foundation from the National Ministries and Commissions of China (Grant No. 51308030201)
关键词 drain-induced barrier lowering EFFECT Poisson’s equation metal semiconductor field EFFECT TRANSISTOR drain-induced barrier lowering effect Poisson’s equation metal semiconductor field effect transistor
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