摘要
We examine the role of CH radical in diamond vapor deposition in mixed gas CH_(4)-H_(2) mainly from the measurement of CH optical emisiop spectrum. Two dynamic parameters, the ratio of Intensity of CH to H spectra, I_(CH)/I<_(H), and the rat of change of spectra intensity with pressure, |⊿I/⊿P|, are introduced to characterize the plasma. On the basis of these two parameters, the diamond deposition conditions are discussed.
We examine the role of CH radical in diamond vapor deposition in mixed gas CH_(4)-H_(2) mainly from the measurement of CH optical emisiop spectrum. Two dynamic parameters, the ratio of Intensity of CH to H spectra, I_(CH)/I<_(H), and the rat of change of spectra intensity with pressure, |⊿I/⊿P|, are introduced to characterize the plasma. On the basis of these two parameters, the diamond deposition conditions are discussed.
出处
《真空科学与技术学报》
EI
CAS
CSCD
1992年第Z1期99-102,共4页
Chinese Journal of Vacuum Science and Technology
基金
Projedt supported by the National Science funds and Aeronautic Science Funds of P.R.China
