摘要
In this paper, damages and annealing effects of X,Y and Z cut LiNbO-3 implanted by 350keV high energy Ti (1.5 x 10<sup>17</sup> / cm<sup>2</sup>) are studied. The surface damages of X,Y cut plates are nearly amorphous, but the surface damage of Z cut does not reach saturation. Radiation damage is mainly due to Nb moving atoms and Ti atoms occupy the interstitial sites. By annealing the sample at 1000℃, most damage is removed from the boundary between implanted layer and LiNbO<sub>3</sub> base to surface.
In this paper, damages and annealing effects of X,Y and Z cut LiNbO-3 implanted by 350keV high energy Ti (1.5 x 10<sup>17</sup> / cm<sup>2</sup>) are studied. The surface damages of X,Y cut plates are nearly amorphous, but the surface damage of Z cut does not reach saturation. Radiation damage is mainly due to Nb moving atoms and Ti atoms occupy the interstitial sites. By annealing the sample at 1000℃, most damage is removed from the boundary between implanted layer and LiNbO<sub>3</sub> base to surface.
出处
《真空科学与技术学报》
EI
CAS
CSCD
1992年第Z1期159-162,共4页
Chinese Journal of Vacuum Science and Technology
