高度择优取向(111)PbTiO_3薄膜的制备及光学特性

Study on Manufacturing Highly Oriented (111)PbTiO_3 Thin Film and its Optical Properties

单一取向铁电薄膜是大家长期以来研究的目标之一 ,文中采用组合靶射频溅射在白宝石 (α- Al2 O3)衬底上制备出具有较好的 (111)择优取向的 Pb Ti O3薄膜。从薄膜的光学透射谱计算所得的折射率和波长的关系能够较好地符合单振子模型 ,由此得出了薄膜在 4 0 0～ 2 4 0 0 nm区域的折射率变化 ,在长波极限时薄膜的折射率为2 .5

Highly oriented (111)PbTiO 3 thin film with pervoskite type microstructure was synthesized directly on the α Al 2O 3 substrate using a rf magnetron sputtering system with a composite target.The relation between refractive index and wavelength,calculated from the transmittance spectrum of the film,fits the individual dipole oscillator model very well.Thus,the dispersion property from 400 nm to 2 400 nm could be calculated,and the minimum refractive index of the film is 2.51.