摘要
光刻技术是推动集成电路制造业不断向前发展的关键技术 ,X射线光刻技术是下一代光刻技术的一种 ,具有产业化的应用前景。掩模技术是X射线光刻技术的难点 。
Lithography technique has been the key point to push forward the USL fabricator. X-ray lithography (XRL) is one of the next generation lithography techniques (NGL), which has the probability of industrialization. The mask technique is the crux cell. This paper reports the latest development of XRL and mask fabricator technique in BSRF.
出处
《核技术》
CAS
CSCD
北大核心
2002年第10期817-821,共5页
Nuclear Techniques
