对靶非平衡磁控溅射系统平面探针诊断

Diagnosis of unbalanced magnetron sputtering of dual target system by a plane plate probe

对靶非平衡磁控溅射系统由两个相对磁控溅射靶和一个磁镜场约束系统构成 ,通过调整电磁线圈的激励电流可以控制磁镜场的空间分布状态 ,测量了合成磁场的空间分布状态。采用平面探针方法 ,在两靶中间位置测量了收集电流密度。结果表明 ,探针的收集电流密度随磁镜场的激励电流增加显著增大 ,在偏压 15 0V、工作气体 Ar、压力 0 .2 Pa和磁控溅射靶工作电流 3A时 ,收集的电流密度可以达到 5 .77m A / cm2 。

The unbalanced magnetron system, which is composed of dual face to face magnetron targets and a magnetic mirror field system, is researched by a plate probe. The variety functional film can be made by changing the running parameters and the target materials. The plane probe is used to diagnose the collected current density. The results indicate that the collected current density is increasing with the magnetic field current. It is reach to 5.77 mA/cm 2 at bias voltage being 150 V, the discharge gas being Ar, pressure being 0.2 Pa and target current being 3 A.